- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/027 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Patent holdings for IPC class G03F 7/027
Total number of patents in this class: 2354
10-year publication summary
153
|
151
|
170
|
200
|
212
|
192
|
185
|
210
|
143
|
49
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
FUJIFILM Corporation | 27102 |
509 |
Hitachi Chemical Company, Ltd. | 2455 |
85 |
Toray Industries, Inc. | 6652 |
84 |
LG Chem, Ltd. | 17205 |
69 |
Mitsubishi Chemical Corporation | 4313 |
52 |
Taiyo Ink Mfg. Co., Ltd. | 219 |
52 |
Asahi Kasei Kabushiki Kaisha | 2429 |
41 |
JSR Corporation | 2476 |
37 |
Boe Technology Group Co., Ltd. | 35384 |
37 |
Resonac Corporation | 2233 |
36 |
Tokyo Ohka Kogyo Co., Ltd. | 1481 |
32 |
Samsung SDI Co., Ltd. | 6671 |
28 |
Adeka Corporation | 1333 |
28 |
DIC Corporation | 3597 |
27 |
Showa Denko Materials Co., Ltd. | 629 |
27 |
Canon Inc. | 36841 |
25 |
Nissan Chemical Corporation | 1725 |
25 |
Konica Minolta Medical & Graphic, Inc. | 986 |
24 |
Asahi Glass Company, Limited | 2985 |
24 |
DONGWOO FINE-CHEM Co., Ltd. | 1163 |
23 |
Other owners | 1089 |